Presentation Details
| Pre-deposition Substrate Cleaning and Plasma Surface Treatment Effects on CdSeTe/CdTe Robert D.Ellis, Zeyad Elsayed, Luke Jones, Samuel E.Machin, Adam Law, Jacques D Kenyon, Mustafa Togay, John M.Walls, Jake W.Bowers. Loughborough University, Loughborough, United Kingdom |
Abstract
The effects of different cleaning and surface treatment processes during substrate preparation on first layer deposition quality and overall cell performance has been investigated to determine the optimal process and its scale of influence on final cell performance. Cleaning/surface treating using a manual method, ultrasonic bath, commercial optical cleaning machine, ozone cleaner, and plasma cleaner have all been investigated. It is found that the commercial optical cleaning equipment produces a >2% increase in overall average efficiency (10.9%) when compared to the more manual ultrasonic bath system (8.77%). Removing the storage step further increased overall average cell efficiency by 1.8% (12.7%) while switching from ozone to plasma cleaning and surface treatment further increased average cell efficiency by 2.8% (15.5%) and produced a lab record undoped cell efficiency of 17.1% (17.9% after light soaking). Different substrate storage methods have also been investigated with dry storage in a desiccator found to be the best solution, however immediate use still yields better results.
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No part of this publication may be reproduced, distributed, or transmitted in any form or by any means, including photocopying, recording, or other electronic or mechanical methods, without the prior written permission of the author.
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