Presentation Details
| Characterization of Organic Semiconductor Thin Films Prepared via Mist Deposition byMultifunctional Scanning Probe Microscopy Nobuo Satoh1, Yuma Saitoh1, Taiga Kaiami2, Shigetaka Katori2. 1Chiba Institute of Technology, Narashino, Japan.2National Institute of Technology, Tsuyama College, Tsuyama, Japan |
Abstract
This study investigates organic semiconductor thin films produced by mist deposition using advanced scanning probe microscopy (SPM) methods. Mist deposition is presented as a cost-effective, scalable alternative to vacuum evaporation for fabricating flexible organic electronics. The technique reliably forms uniform films of n-type semiconductors such as fullerene (C60) and PCBM. SPM techniques—including AFM, KFM, and SCFM—are applied to examine film morphology, surface properties, and nanoscale phase separation. Findings demonstrate that mist deposition, alongside SPM analysis, enables efficient optimization and improved performance in next-generation organic semiconductor devices.
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No part of this publication may be reproduced, distributed, or transmitted in any form or by any means, including photocopying, recording, or other electronic or mechanical methods, without the prior written permission of the author.
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