Presentation Details
Annealing Mechanisms in Proton-irradiated, Ultra-thin InP Epitaxial Solar Cells

James H.Shin, Toluwalase Agoro, Venkata S.A.Chaluvadi, Louise C.Hirst.

University of Cambridge, Cambridge, United Kingdom

Abstract


InP solar cells have demonstrated increased radiation tolerance, a large part due to their enhanced minority-carrier injection and thermal annealing capabilities. Development on ultra-thin III-V device structures presents another avenue for increased radiation tolerance. Previous studies on InP have focused on devices with absorber layers orders of magnitude thicker than ultra-thin devices and have demonstrated differences in annealing capability with variation in device structure and fabrication. This work investigates the annealing mechanisms of epitaxial, ultra-thin InP solar cells exposed to 2MeV protons at fluences of 1011 – 1015 cm-2. Continuous-wave photoluminescence (CWPL) is harnessed to explore the minority-carrier injection and thermal annealing capabilities within irradiated, ultra-thin InP solar cells with absorber thicknesses of 100, 160, and 300 nm. Minority-carrier injection through continuous laser exposure resulted in increased PL intensities in devices irradiated to fluences at and above 1013 cm-2 while minimal changes were observed in devices below that fluence. However, an extended period in the dark resulted in a relaxation of PL intensity towards the cell’s initial measured value, suggesting a potential temporary nature of this annealing mechanism. Thermal annealing of an ultra-thin InP device at 450K was performed for 3 hours, resulting in an increase in photoluminescence intensity. These results suggest that photoinduced minority-carrier injection and thermal annealing reduces radiation-induced defects within ultra-thin, epitaxial InP, enhancing its appeal for space applications. 

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